尚林,男,1987年12月生,讲师,工学博士,现在陕西科技大学材料原子·分子科学研究所从事教学与科研工作。
【研究方向】
主要从事氮化镓、砷化镓基半导体材料的外延生长(MOCVD、MBE设备)与性能表征方面的研究工作,以及相关半导体器件(激光器、探测器、太阳能电池及晶体管)的制备和研究。以第一作者发表学术论文6篇,授权发明专利2项。主持陕西省青年基金1项,其它2项。
【个人简历】
2006年9月—2010年6月,河北科技大学金属材料工程专业,获工学学士学位
2010年9月—2016年12月,太原理工大学材料科学与工程专业,获工学博士学位
【科研成果】
1. Lin Shang, Bingshe Xu*, Shufang Ma, Qingming Liu, Huican Ouyang, Hengsheng Shan, Xiaodong Hao and Bin Han. The Surface Morphology Evolution of GaN Nucleation Layer during Annealing and Its Inflfluence on the Crystal Quality of GaN Films.Coatings 2021, 11, 188.
2. Lin Shang*, Bingshe Xu, Shufang Ma, Huican Ouyang, Hengsheng Shan, Xiaodong Hao, Bin Han. Enhanced luminescence property of GaN-based LEDs with p-InGaN cap layer grown on p-GaN surface; Materials Science in Semiconductor Processing; 2022, 146, 106666.
3. Lin Shang, Taiping Lu, Guangmei Zhai, Zhigang Jia, Hua Zhang, Shufang Ma, Tianbao Li, Jian Liang, Xuguang Liu, Bingshe Xu*. The evolution of a GaN/sapphire interface with different nucleation layer thickness during two-step growth and its influence on the bulk GaN crystal quality. RSC Advances, 2015, 5(63): 51201–51207.
4. Lin Shang, Guangmei Zhai, Zhigang Jia, Fuhong Mei, Taiping Lu, Xuguang Liu, Bingshe Xu*. Effect of light Si doping on the properties of GaN. Physica B, 2016, 485: 1–5.
5. Lin Shang, Guangmei Zhai, Fuhong Mei, Wei Jia, Chunyan Yu, Xuguang Liu, Bingshe Xu*. The effect of nucleation layer thickness on the structural evolution and crystal quality of bulk GaN grown by a two-step process on cone-patterned sapphire substrate. Journal of Crystal Growth, 2016, 442: 89–94.
6. Lin Shang, Shufang Ma, Jian Liang, Tianbao Li, Chunyan Yu, Xuemin Li, Xuguang Liu, Bingshe Xu*. The properties of p-GaN with different Cp2Mg/Ga ratio and their influence on the conductivity. Journal of electronic materials, 2016, 45(6): 2697–2701.
【联系方式】
电话:15698411836
Email:shanglin@sust.edu.cn